A principal possibility to overcome fundamental (intrinsic) limit of pure optical materials laser light resistance is investigated by designing artificial materials with desired optical properties. We explore the suitability of high band-gap ultra-low refractive index material (n less than 1.38 at 550 nm) in the context of highly reflective coatings with enhanced optical resistance. The new generation all-silica (porousonporous) SiO2 thin film mirror with 99% reflectivity was prepared by glancing angle deposition (GLAD). Its damage performance was directly compared with state of the art hafnia/silica coating produced by Ion-Beam-Sputtering. Laser-Induced Damage Thresholds (LIDT) of both coatings were measured in nanosecond regime at 355 nm wavelength. Novel approach indicates the potential for coating to withstand laser fluence of at least 65 J/cm2 without reaching intrinsic threshold value. Reported concept can be expanded to virtually any design thus opening a new way of next generation thin film production well suited for high power laser applications.
展开▼
机译：通过设计具有所需光学性能的人造材料，研究了克服纯光学材料的基本（固有）极限的主要可能性，即耐激光性。我们探索了在高反射涂层和高光学电阻的情况下，高带隙超低折射率材料（在550 nm处n小于1.38）的适用性。通过掠射角沉积（GLAD）制备了具有99％反射率的新一代全二氧化硅（多孔/无孔）SiO2薄膜镜。将其破坏性能直接与离子束溅射生产的氧化ha /二氧化硅涂层进行比较。两种涂层的激光诱导损伤阈值（LIDT）均在355 wavelengthnm波长的纳秒范围内测量。新颖的方法表明涂层在不达到固有阈值的情况下承受至少65 J / cm 2 的激光通量的潜力。报告的概念几乎可以扩展到任何设计，从而开辟了一种新的下一代薄膜生产方式，非常适合大功率激光应用。
展开▼
