首页> 美国卫生研究院文献>Scientific Reports >Predicting Global Minimum in Complex Beryllium Borate System for Deep-ultraviolet Functional Optical Applications
【2h】

Predicting Global Minimum in Complex Beryllium Borate System for Deep-ultraviolet Functional Optical Applications

机译:预测用于深紫外功能光学应用的复杂硼酸铍系统的全局最小值

代理获取
本网站仅为用户提供外文OA文献查询和代理获取服务,本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文,但由于OA文献来源多样且变更频繁,仍可能出现获取不到、文献不完整或与标题不符等情况,如果获取不到我们将提供退款服务。请知悉。

摘要

Searching for high performance materials for optical communication and laser industry in deep-ultraviolet (DUV) region has been the subject of considerable interest. Such materials by design from scratching on multi-component complex crystal systems are challenging. Here, we predict, through density function calculations and unbiased structure searching techniques, the formation of quaternary NaBeBO3 compounds at ambient pressure. Among the four low-energy phases, the P63/m structure exhibits a DUV cutoff edge of 20 nm shorter than α-BaB2O4 (189 nm) – the best-known DUV birefringent material. While the P-6 structure exhibits one time second-harmonic generation efficiency of KH2PO4 and possesses excellent crystal growth habit without showing any layer habit as observed in the only available DUV nonlinear optical material KBe2BO3F2, whose layer habit limits its wide industrial applications. These NaBeBO3 structures are promising candidates for the next generation of DUV optical materials, and the structure prediction technique will shed light on future optical materials design.
机译:在深紫外(DUV)地区寻找用于光通信和激光工业的高性能材料已成为人们关注的主题。通过在多组分复合晶体系统上刮擦而设计出的此类材料具有挑战性。在这里,我们通过密度函数计算和无偏结构搜索技术预测在环境压力下四元NaBeBO3化合物的形成。在四个低能阶段中,P63 / m结构的DUV截止边缘比最著名的DUV双折射材料α-BaB2O4(189 nm)短20µnm。尽管P-6结构表现出KH2PO4的二次谐波生成效率,并且具有优异的晶体生长习性,但在唯一可用的DUV非线性光学材料KBe2BO3F2中却没有表现出任何层习性,其层习性限制了其广泛的工业应用。这些NaBeBO3结构是下一代DUV光学材料的有希望的候选者,并且结构预测技术将为未来的光学材料设计提供启发。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
代理获取

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号