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Explosion Suppression Mechanism Characteristics of MEMS SA Device With In Situ Synthetic Primer

机译:原位合成底漆的MEMS S&A装置的爆炸机理特性

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摘要

The traditional silicon-based micro-electro-mechanical systems (MEMS) safety and arming (S&A) device fuze cannot isolate abnormal outputs in the detonation environment, which creates hazards for personnel. To address this problem, we report the design of a MEMS S&A device with integrated silver, copper, nickel and polyimide (PI) films, which is based on the principle of a MEMS S&A device and uses copper azide as the primer. The MEMS S&A device was optimized using theoretical calculations of the explosion suppression mechanism performance in a detonation field, where the theoretical model was verified by dynamic simulation (LS-Dyna). Silicon-based MEMS processing technology was used to integrate the MEMS S&A device with energy-absorbing materials, and the device performance was compared in detonation tests. Silicon-based MEMS S&A devices with silver, copper, nickel, and PI (100-μm-thick) achieved a reliable explosion suppression mechanism capability when exposed to a detonation wave. The residual stress was measured using Raman microscopy, and the PI film exhibited the best explosion suppression mechanism performance of the four materials. A reliability test to determine the maximum explosion suppression mechanism dose for a MEMS S&A device attached to a PI film (100-μm-thick) showed that the maximum amount of primer needed for the effective explosion suppression mechanism capability on the MEMS S&A device was 0.45 mg.
机译:传统的基于硅的微电子机械系统(MEMS)安全和设防(S&A)设备引信无法在爆炸环境中隔离异常输出,这会对人员造成危害。为了解决这个问题,我们报告了基于MEMS S&A器件原理并使用叠氮化铜作为底漆的具有集成银,铜,镍和聚酰亚胺(PI)膜的MEMS S&A器件的设计。 MEMS S&A装置使用爆炸场中爆炸机理性能的理论计算进行了优化,并通过动态仿真(LS-Dyna)验证了理论模型。基于硅的MEMS处理技术被用于将MEMS S&A器件与能量吸收材料集成在一起,并且在爆炸测试中比较了该器件的性能。具有银,铜,镍和PI(厚度为100μm)的硅基MEMS S&A器件在暴露于爆炸波时可实现可靠的爆炸抑制机制。使用拉曼显微镜测量残余应力,PI膜表现出四种材料中最佳的爆炸机理。确定附着在PI膜上的MEMS S&A装置的最大爆炸抑制机理剂量(厚度为100μm)的可靠性测试表明,MEMS S&A器件的有效爆炸抑制机理所需的最大底漆量为0.45毫克

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