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Superlubricity of epitaxial monolayer WS2 on graphene

机译:外延单层WS2在石墨烯上的超润滑性

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摘要

We report the superlubric sliding of monolayer tungsten disulfide (WS2) on epitaxial graphene (EG) grown on silicon carbide (SiC).Single-crystalline WS2 flakes with lateral size of hundreds of nanometers are obtained via chemical vapor deposition (CVD) on EG.Microscopic and diffraction analyses indicate that the WS2/EG stack is predominantly aligned with zero azimuthal rotation.The present experiments show that,when perturbed by a scanning probe microscopy (SPM) tip,the WS2 flakes are prone to slide over the graphene surfaces at room temperature.Atomistic force field-based molecular dynamics simulations indicate that,through local physical deformation of the WS2 flake,the scanning tip releases enough energy to the flake to overcome the motion activation barrier and trigger an ultralow-friction rototranslational displacement,that is superlubric.Experimental observations show that,after sliding,the WS2 flakes come to rest with a rotation of nπ/3 with respect to graphene.Moreover,atomically resolved measurements show that the interface is atomically sharp and the WS2 lattice is strain-free.These results help to shed light on nanotribological phenomena in van der Waals (vdW) heterostacks,and suggest that the applicative potential of the WS2/graphene heterostructure can be extended by novel mechanical prospects.
机译:我们报道了单层二硫化钨(WS2)在碳化硅(SiC)上生长的外延石墨烯(EG)上的超润滑滑动性。通过在EG上进行化学气相沉积(CVD)获得了横向尺寸为数百纳米的单晶WS2薄片。显微镜和衍射分析表明WS2 / EG堆主要与零方位角旋转对齐。本实验表明,当被扫描探针显微镜(SPM)尖端干扰时,WS2薄片在室内容易在石墨烯表面上滑动基于原子力场的分子动力学模拟表明,通过WS2薄片的局部物理变形,扫描尖端向薄片释放了足够的能量,从而克服了运动激活障碍并触发了超低摩擦的旋转平移位移,即超级润滑。实验观察表明,在滑动后,WS2薄片相对于石墨烯旋转nπ/ 3静止。解析后的测量结果表明,该界面原子清晰且WS2晶格无应变。通过新颖的机械前景得以扩展。

著录项

  • 来源
    《纳米研究(英文版)》 |2018年第11期|5946-5956|共11页
  • 作者单位

    Center for Nanotechnology Innovation @NEST, Istituto Italiano di Tecnologia, Piazza S.Silvestro 12, 56127 Pisa, Italy;

    Center for Nanotechnology Innovation @NEST, Istituto Italiano di Tecnologia, Piazza S.Silvestro 12, 56127 Pisa, Italy;

    NEST, Istituto Nanoscienze-CNR and Scuola Normale Superiore, Piazza San Silvestro 12, 56127 Pisa, Italy;

    Center for Nanotechnology Innovation @NEST, Istituto Italiano di Tecnologia, Piazza S.Silvestro 12, 56127 Pisa, Italy;

    Center for Nanotechnology Innovation @NEST, Istituto Italiano di Tecnologia, Piazza S.Silvestro 12, 56127 Pisa, Italy;

    NEST, Istituto Nanoscienze-CNR and Scuola Normale Superiore, Piazza San Silvestro 12, 56127 Pisa, Italy;

    NEST, Istituto Nanoscienze-CNR and Scuola Normale Superiore, Piazza San Silvestro 12, 56127 Pisa, Italy;

    Center for Nanotechnology Innovation @NEST, Istituto Italiano di Tecnologia, Piazza S.Silvestro 12, 56127 Pisa, Italy;

    Graphene Labs, Istituto Italiano di Tecnologia, Via Morego 30, 16163 Genova, Italy;

  • 收录信息 中国科学引文数据库(CSCD);中国科技论文与引文数据库(CSTPCD);
  • 原文格式 PDF
  • 正文语种 eng
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  • 入库时间 2022-08-19 04:27:06
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