首页> 中文期刊> 《膜科学与技术》 >Al2O3无机薄膜的制备、热稳定性及表面自由能计算

Al2O3无机薄膜的制备、热稳定性及表面自由能计算

         

摘要

Al2O3 inorganic films was prepared in a sol-gel process,using aluminum isopropoxide (AIP) as precursor,nitric acid as the peptizer.The thermal stability and surface free energy of inorganic film materials were studied by X-ray diffraction(XRD),energy disperse spectroscopy(EDS),Fourier transform infrared spectroscopy(FTIR),thermogravimetry-differential thermal gravimetry (TG-DTG) and contact angle measurement.The results showed that,with the increasing of calcination temperature,the absorption peak of C—H is weakened and the Al—O—H bond gradually breaked.When calcined at 350 ℃,Al—O bond was the primary chemical structure of the sample materials,the phase structure of the sample was transformed from the γ-Al OOH to the γ-Al2O3,the grain size calculated from the strongest diffraction peak corresponding to the crystal plane of (440) reaches 4.2 nm.The corresponding Al/O element atomic and weight percentage of the film materials was coincided with the chemical composition of Al2O3 and the surface free energy can reach a minimum of 46.24× 10-5 N/cm.%以异丙醇铝(AIP)为前体,硝酸为胶溶剂,采用溶胶-凝胶法制备Al2O3无机薄膜.通过X射线衍射(XRD)、能谱分析(EDS)、红外光谱(FTIR)、热重-微分热重(TG-DTG)、接触角测试等表征,对无机薄膜的热稳定性及表面自由能进行研究.结果表明,随着焙烧温度的升高,C-H吸收峰减弱,Al-O-H键逐渐断裂,表面自由能先减小后增大;350℃时化学结构以Al-O键为主,物相结构由γ-AlOOH转变为γ-Al2O3,对应最强衍射峰(440)晶面处的晶粒尺寸达到4.2 nm,膜材料对应的Al/O元素原子及重量百分比与Al2O3化学组成匹配,表面自由能达到最小值46.24×10-5 N/cm.

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