CVD法制备ZrC涂层与ZrC-TaC共沉积涂层的烧蚀性能

摘要

采用ZrCl4-CH4-H2-Ar与ZrCl4-TaCl5-CH4-H2-Ar反应体系，用化学气相沉积(CVD)制备ZrC涂层与ZrC-TaC共沉积涂层，并对其进行氧−乙炔焰烧蚀试验研究。利用X射线衍射(XRD)和扫描电镜(SEM)等分析技术对烧蚀前后ZrC与ZrC-TaC共沉积涂层的相组成及微观结构进行表征，并分析2种涂层的烧蚀机理。结果表明：ZrC涂层为细柱状晶体组织，ZrC-TaC共沉积涂层为ZrC与TaC成分周期性波动自组装多层复合结构，具有良好的组织结构可控性。经过60 s氧−乙炔焰烧蚀试验，ZrC-TaC复相涂层表现出良好的抗热震性和整体完整性，与基体连接良好，无剥蚀和脱落，烧蚀性能明显优于单一ZrC涂层的烧蚀性能。ZrC-TaC复合涂层线烧蚀率和质量烧蚀率分别为5.3×10−5 mm/s和3.2×10−5 g/s，表现出良好的抗烧蚀性能。%ZrC and ZrC-TaC coatings were deposited by chemical vapor deposition (CVD) using a gas mixture of ZrCl4, TaCl5, H2, CH4 and Ar. The microstructure and ablation properties of ZrC and ZrC-TaC coatings were characterized by X-ray diffraction, scanning electron microscopy and oxyacetylene torch ablation test. The ablation mechanism of the coatings was also investigated. The results show that the as-prepared coating is biphasic coating consisting of ZrC and TaC. The coating structure can be controlled by adjusting the deposition processing and the deposited coating exhibits multilayered-structure with columnar-crystal layer inserting between two particle-stacked layers. During ablation, the co-deposition coating exhibits outstanding configurational stability and good adhesion to substrate. After ablation for 60 s, the mass and linear ablation rates of the coated sample are 3.2´10−5 g/s and 5.3´10−5 mm/s, respectively, indicating that the coating has excellent ablation resistance properties.