分子玻璃光致抗蚀剂研究进展

摘要

随着半导体芯片集成度的快速提高，光刻技术的分辨率正由90、65和45nm迈向更先进的32nm或以下．而分子玻璃体抗蚀剂可能是下一代光刻技术的最好选择．本文阐述了分子玻璃光致抗蚀剂的设计思想，并介绍了几种性能良好的分子玻璃光致抗蚀剂．%As the semiconductor chip compositive rise quickly,lithography resolution is from 90 nm,65 nm and 45 nm towards more advanced 32 nm. While molecular glass photoresists may be the best choice of next generation lithography technology. The conception of molecular glass photoresist design is expounded, and several good performance of molecular glass photoresists are introduced