三维Ni亚微米柱阵列的制备及微结构研究

摘要

Ni submicron columns array was prepared by magnetron sputtering on anodic aluminum oxide (AAO) template.The influence of different annealing temperature on the structure stability of Ni submicron columns array was studied.The crystal structure and surface morphology of Ni submicron columns array,which was prepared under the different annealing temperature,were characterized by atomic force microscopy (AFM),X-ray diffraction (XRD),scanning electron microscopy(SEM).The results show that the Ni submicron columns array has a polycrystalline Fcc structure.The arrangement rule and the thickness are uniform,and the diameter is about 400 nm.After annealing at 400 ℃,the intermetallic compound Al1.1 Ni0.9 and AlNi begin to form.After annealing at 500 ℃,hollow Ni submicron columns form,and Ni submicron columns expand and thicken.And on increasing the annealing temperature to 600 ℃,Ni submicron columns fall off partly.%利用磁控溅射法在阳极氧化铝(AAO)模板上制备了 Ni 亚微米柱阵列,研究了不同退火温度对 Ni 亚微米柱阵列结构稳定性的影响。通过原子力显微镜(AFM)、X 射线衍射仪(XRD)、扫描电子显微镜(SEM)等对不同退火温度下制备的Ni亚微米柱阵列的晶体结构以及表面形貌进行了表征。结果表明,磁控溅射法制备的Ni亚微米柱阵列具有多晶的面心立方结构,排列规则、粗细均匀,其直径约为400 nm。经400℃退火后,开始形成Al1．1 Ni0．9和AlNi金属间化合物。500℃退火后,出现空心Ni亚微米柱,且Ni亚微米柱体积膨胀变粗。600℃退火后,Ni亚微米柱部分脱落。