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Photoelectrochemical study of MoO3 assorted morphology films formed by thermal evaporation简

机译:热蒸发形成MoO3形貌薄膜的光电化学研究

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摘要

Molybdenum oxide nanostructured thin films were grown on fluorine doped tin oxide(FTO), indium doped tin oxide(ITO) and ordinary glass substrates by thermal evaporation process without vacuum and catalysts using molybdenum trioxide(MoO3) powder as a source material and oxygen as a carrier gas.Various morphologies including nanobelts, disks and hexagonal rod-like nanostructures were obtained by changing the source and substrate temperatures during the growth of MoO3 thin films. Structural parameters, morphology, composition and surface features of the films were characterized by XRD, SEM, EDAX,XPS, AFM and Raman spectroscopy. The films were orthorhombic in structure with preferred orientation along(0 1 0) plane. Morphology analysis reveals randomly aligned nanobelts with 40 nm in thickness and a width of 800 nm and 3–12 mm in length. The disks have 1.5 μm diameters, 1 μm thickness and hexagonal rod-like nanostructures with a length, breath and width of 2 μm, 1 μm and 100 nm are formed. The samples were investigated under dark and photocurrent conditions in H2SO4 aqueous solution as a function of applied potential. The photocurrent density of samples prepared on ITO and FTO substrate samples were compared and the results are discussed.
机译:在氟掺杂氧化锡(FTO)上生长氧化钼纳米结构薄膜通过热蒸发过程在没有真空和催化剂的情况下使用钼和催化剂作为源材料和氧作为氧气作为源材料和氧气作为a通过改变Moo3薄膜的生长期间,通过改变源极和衬底温度,获得包括纳米螺纹,磁盘和六边形棒状纳米结构的载体气体。薄膜的结构参数,形态,组成和表面特征,其特征在于XRD,SEM,edax,XPS,AFM和拉曼光谱。薄膜在结构上以沿(0 1 0)平面的优选取向为正极形成。形态学分析显示随机对准厚度40nm的纳米轴,宽度为800nm和3-12mm的长度。该盘具有1.5μm直径,1μm厚度和六边形棒状纳米结构,长度,呼吸和宽度为2μm,1μm和100nm。根据施加电位的函数,在H 2 SO 4水溶液中的暗和光电流条件下研究样品。比较在ITO和FTO基板样品上制备的样品的光电流密度,并讨论结果。

著录项

  • 来源
    《能源化学:英文版》 |2016年第005期|P.798-804|共7页
  • 作者单位

    Department of Physics, Alagappa University;

    Department of Electrical and Computer Engineering, Ajou University;

  • 收录信息 中国科学引文数据库(CSCD);
  • 原文格式 PDF
  • 正文语种 CHI
  • 中图分类
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  • 入库时间 2022-08-19 04:04:57
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