光伏企业硅片清洗废水处理工程实例

摘要

The combined process,coagulation sedimentati on-UASB-A/O treatment system-secondary sedimenta-tion,has been used for treating the wafer cleaning wastewater from photovoltaic industry. The design parameter of the project,the starting processes of UASB reactor and A/O treatment system and the operation status of the treatment project are introduced. The operation results indicate that the COD and SS of the effluent are 117 mg/L and 71 mg/L, respectively,and their removing rates are 95.4%and 96.2%,respectively,meeting the requirements of the indirect discharge limit value specified in the Emission Standard of Pollutants for Battery Industry (GB 30484—2013). The process runs stably,being a kind of reliable process for treating wafer cleaning wastewater.%采用混凝沉淀—UASB—A/O处理系统—二次沉淀工艺对光伏企业硅片清洗废水进行处理，介绍了工程设计参数、UASB厌氧反应器和A/O处理单元的启动过程及处理工程运行情况。运行结果表明：出水COD、SS、分别为117、71 mg/L，去除率分别为95．4%、96．2%，达到《电池工业污染物排放标准》（GB 30484—2013）中的间接排放限值要求。该工艺运行稳定，是一种可靠的硅片清洗废水处理工艺。