脉冲激光沉积技术（PLD）目前已成为一种重要的制备氧化锌（ZnO）薄膜的技术,但是由于脉冲瞬间沉积时不能避免产生液滴及形成大小不一的颗粒,因此在制备高质量ZnO薄膜的表面均匀性方面还存在一定弊端。文章采用PLD（KrF准分子激光器：波长248 nm,频率5 Hz,脉冲宽度20 ns）方法在衬底温度450℃和氧气流量10 sccm下以高纯ZnO为靶材、在单晶硅衬底表面沉积120 min成功生长了ZnO薄膜。扫描电子图像（SEM）显示ZnO薄膜表面有明显凸起的颗粒,文章通过俄歇能谱仪对ZnO薄膜进行了研究,分析了ZnO薄膜的表面成分及凸起颗粒微观区域的成分。实验结果表明制备的ZnO薄膜表面明显突起的颗粒为ZnO颗粒,文章为PLD法制备ZnO薄膜易形成大小不一的颗粒提供了理论依据。%Pulsed laser deposition method was very important preparation method of ZnO film presently.It was because that drippings were produced inevitably when impulse was deposition,and granules were formed large or small.So,there were some disadvantages on surfacing uniform of high quality oxide films preparation.In our work,we prepared one sample of ZnO film with 120 minutes deposition times using high pure ZnO as a target,on single crystal silicon（Si） by pulsed laser deposition method（PLD）（KrF exciter laser： wavelength 248 nm,pulse frequency 5 Hz,pulse duration 20 ns） at 450 ℃ substrate temperature and 10 sccm O2 flow rate.Particals were appeard obviously on the surface of ZnO film which were shown by Scanning electron microscope（SEM）.The material of the film has been studied by auger electron spectroscopy,the elements of surfacing and microscopic area of the appeared particals have been studied.It was obvious that the appeared particals on the surface of ZnO film were ZnO particals which was prepared at this technic parametres.So,the theory evidence of particals were formed large or small on the surface of ZnO film by PLD was offered.
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