亚纳米级抛光加工实验室的管理与维护

摘要

With the rapid improvement of electronic manufacturing technology, the demand for super-smooth surfaces becomes increasing. Atom-scale polishing is the main method to achieve super-smooth surfaces. At present, chemical mechanical polishing (CMP), electro-chemical mechanical polishing (ECMP), abrasive-free chemical mechanical polishing(AP-CMP), magnetorheological polishing (MRP), etc. are the commonly used methods in atom-scale polishing. The influences on polishing are as follows: polishing slurry, polishing parameters, polishing environment, etc. Among them, the laboratory environment is one of the main factors that must be managed and maintained.%亚纳米级抛光是获得超光滑表面的主要方法.目前,常用的亚纳米级抛光方法有化学机械抛光(CMP)、电化学机械抛光(ECMP)、无磨料化学机械抛光(AP-CMP)、磁流变抛光(MRP)等.亚纳米级抛光质量受抛光液、抛光条件和抛光环境等诸多方面的影响.抛光实验室的抛光环境是超光滑表面的重要影响因素之一,必须对抛光环境的各个方面加以科学管理和维护.