单晶片清洗设备化学药液温度控制系统研制

摘要

A chem ical tem perature control system is developed for a 300 m m single w afer cleaning system . D ue to the inertia,long tim e delay,nonlinear properties of the chem ical delivery system ,a tem perature control m ethod based on Sm ith prediction algorithm is designed. T he control system is im plem ented based on Program m er C om puter C ontroller (PC C ). T he hardw are system and control algorithm ofthe controlsystem are introduced in this paper.E xperim entresults show this system can m eet the process requirem ents. A nd the system has been applied on 300 m m 65 nm copper-interconnection single w afercleaning system successfully.%针对300mm单晶片清洗设备，设计开发了一套化学药液温度控制系统。由于化学药液传输系统具有大惯性、大时滞、非线性的特点，采用Smith预估法设计了一种温度控制算法；并基于可编程计算机控制器（PCC）设计实现了化学药液温度控制系统。介绍了该控制系统的硬件组成和控制算法设计，实验结果表明该温度控制系统能够满足清洗工艺需求。该系统现已成功应用于自主研发的300mm、65nm铜互连单片清洗设备。