真空蒸发、淀积、溅射、氧化与金属化工艺

摘要

正 Y2002-63234-229 0300369等离子体化学汽相淀积气体循环清洗减少全氟化物(PFC)辐射=Reduction of PFC emissions by gas circula-tion cleanjng in plastor CVD[会,英]/Nakata,R.&Kubota,H.//2001 IEEE International Symposium onSemiconductor Manufacturing.—229～232(E)