机译:H-W-ECR CVD系统中原子氢气氛中热和光诱导退火处理a-Si:H膜的研究
Department of Material Science and Engineering, Beijing University of Technology, Beijing 100022, China;
Jingdezhen Ceramic Institute, Jingdezhen 333001, China;
Department of Material Science and Engineering, Beijing University of Technology, Beijing 100022, China;
Department of Material Science and Engineering, Beijing University of Technology, Beijing 100022, China;
Department of Material Science and Engineering, Beijing University of Technology, Beijing 100022, China;
Department of Material Science and Engineering, Beijing University of Technology, Beijing 100022, China;
Department of Material Science and Engineering, Beijing University of Technology, Beijing 100022, China;
Department of Material Science and Engineering, Beijing University of Technology, Beijing 100022, China;
Department of Material Science and Engineering, Beijing University of Technology, Beijing 100022, China;
Department of Material Science and Engineering, Beijing University of Technology, Beijing 100022, China;
Department of Material Science and Engineering, Beijing University of Technology, Beijing 100022, China;
stability of a-Si:H thin film; TLAH; extended exponential law;