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X-ray study of sputter deposited Ni-Al thin films

机译：溅射沉积的Ni-Al薄膜X射线研究

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作者
Anibou, Noureddine;
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作者单位

University of Houston;

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授予单位 University of Houston;
学科
学位 Ph.D.
年度 2006
页码 140 p.
总页数 140
原文格式 PDF
正文语种 eng
中图分类 AAI3221219;
关键词
Nickel aluminide; Sputter-deposited; Thin films;

机译：镍铝;溅射沉积;薄膜;

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1. Low resistivity of Ni-Al co-doped ZnO thin films deposited by DC magnetron sputtering at low sputtering power [J] . JongWoo Lee, K.N. Hui, K.S.Hui, Applied Surface Science . 2014,第feba28期

机译：直流磁控溅射法在低溅射功率下沉积的Ni-Al共掺杂ZnO薄膜的低电阻率
2. Structure of reactively sputter deposited tin-nitride thin films: A combined X-ray photoelectron spectroscopy, in situ X-ray reflectivity and X-ray absorption spectroscopy study [J] . Dirk Luetzenkirchen-Hecht, Ronald Frahm Thin Solid Films . 2005,第1a2期

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3. X-ray absorption study of the local structure of Mg in hydroxyapatites thin films deposited by RF magnetron Co-Sputtering [J] . Bootchanont Atipong, Wechprasit Tirapat, Horprathum Mati, Radiation Physics and Chemistry . 2020,第1期

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4. Raman, electron microscopy and electrical transport studies of x-ray amorphous Zn-Ir-O thin films deposited by reactive DC magnetron sputtering [C] . M. Zubkins, R. Kalendarev, J. Gabrusenoks Russia/CIS/Baltic/Japan Symposium on Ferroelectricity . 2015

机译：RAMAN，电子显微镜和电气传输研究X射线无定形ZN-IR-O薄膜通过反应性DC磁控溅射沉积
5. Comprehensive study of composition gradient strontium doped lanthanum manganite thin films deposited by magnetron co-sputtering. [D] . Wang, Yishu. 2015

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6. Spatially Resolved Optoelectronic Properties of Al-Doped Zinc Oxide Thin Films Deposited by Radio-Frequency Magnetron Plasma Sputtering Without Substrate Heating [O] . Eugen Stamate 2020

机译：在不加热衬底的情况下通过射频磁控等离子体溅射沉积的铝掺杂氧化锌薄膜的空间分辨光电性能
7. X-Ray Photoelectron Spectroscopy and Raman Spectroscopy Studies on Thin Carbon Nitride Films Deposited by Reactive RF Magnetron Sputtering [O] . Kiyoshi Ogata, Juan C. R. Mittani, Ricardo A. C. Pinto, 2012

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