Comparing UV/chlorine advanced oxidation efficiency to UV/H 2O2 when using monochromatic UV light

摘要

This thesis compares the efficiency of the UV/chlorine and UV/H 2O2 advanced oxidation processes for contaminant removal using monochromatic UV light. Previous work reported that UV/chlorine is more efficient than UV/H2O2 for trichloroethylene removal in pure water at approximately pH 5 and below using medium pressure (MP) lamps (Wang et al., 2012), and that it may even be more competitive in the presence of elevated total inorganic carbon (TIC) and total organic carbon (TOC).;In this work, a LP kinetics model was adapted from the MP model developed by Wang et al. (2012). The modelled results of sucralose decay were then validated by bench-scale experiments with a collimated beam apparatus.;The adapted LP models successfully predicted sucralose decay under most of the experimental conditions, but not at pH 10 for the UV/chlorine process. The reason for the inaccuracy of the UV/chlorine model at pH 10 is not clear, and requires more work.