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Assembly and transport properties of zero and one dimensional structures.

机译:零维和一维结构的组装和传输特性。

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摘要

Two novel assembly processes of zero dimensional structures are presented. First, two-dimensional (2-D), submonolayer annular rings of organically functionalized Ag nanocrystals are formed on solid substrates after controlled evaporation of Ag nanocrystal solution and three-dimensional (3-D) cylindrical ring structures are fabricated based on the template of two-dimensional (2-D) Ag nanocrystal rings. Second, the 2-D structure map (similar to a phase diagram) of Ag nanocrystal superstructures was elucidated. These superstructures were formed at the air-water interface. Two different nanocrystal building blocks, such as Ag nanocrystals with larger metal core/short-chain surfactants and Ag nanocrystals with smaller metal core/long-chain surfactants were used for this work. Three different superstructural motifs, each depending on the composition of the building blocks, are presented with the results of the corresponding assembly structures.; Fabrication and transport properties of one-dimensional (1-D) structures are presented. Chemical vapor deposition of SiH4, coupled with Au- and Zn-nucleated vapor-liquid-solid (VLS) growth, was used to synthesize high aspect ratio, 20 ± 5 nm diameter single crystal Si nanowires (SiNWs), characterized by a nanowire growth directions of ⟨111¯⟩ and ⟨211⟩. The resistivity of as-prepared Au- and Zn-SiNW devices is greater than 10 6 Ω·cm. The resistance of these devices can be lowered significantly via thermal annealing in flowing Ar/H2. The contacts of the devices are characterized by Schottky barriers, and temperature dependent measurements indicate that tunneling is the dominant mechanism for carrier injection. After annealing the nanowire devices in the temperature range 750–800°C, the resistivities of annealed Si-NW's are ∼30 Ω·cm and 10 mΩ·cm for Zn-SiNWs and Au-SiNWs, respectively, and the contacts were effectively Ohmic. This decreased resistance of the nanowire devices was attributed to doping of the nanowires by the Au or Zn catalyst used for wire nucleation and growth. The nanowire resistivities reported for the most highly doped wires are substantially lower than would be expected based on the solid solubility of either Au or Zn in Si. The role that surface states play in electron transport through these nanowire devices is unknown, but are likely responsible for the observed low resistivities.
机译:提出了零维结构的两种新颖的组装工艺。首先,在有控制地蒸发Ag纳米晶体溶液之后,在固体基质上形成有机功能化的Ag纳米晶体的二维(2-D)亚单层环形环,并基于Al2O3的模板制造三维(3-D)圆柱环结构。二维(2-D)Ag纳米晶体环。其次,阐明了Ag纳米晶体超结构的二维结构图(类似于相图)。这些上部结构是在空气-水界面处形成的。两种不同的纳米晶体构件,例如具有较大金属核/短链表面活性剂的Ag纳米晶体和具有较小金属核/长链表面活性剂的Ag纳米晶体用于这项工作。呈现了三个不同的上层建筑图案,每个都取决于构件的组成,并给出了相应装配结构的结果。提出了一维(1-D)结构的制造和传输特性。 SiH 4 的化学气相沉积,加上金和锌成核的气液固(VLS)生长,用于合成高纵横比,直径为20±5 nm的单晶硅纳米线( SiNWs),其特征在于a111和〉211的纳米线生长方向。制备好的Au和Zn-SiNW器件的电阻率大于10 6 Ω·cm。通过在流动的Ar / H 2 中进行热退火,可以显着降低这些器件的电阻。器件的触点以肖特基势垒为特征,与温度相关的测量表明,隧穿是载流子注入的主要机制。将纳米线器件在750–800°C的温度范围内退火后,退火的Si-NW对Zn-SiNWs和Au-SiNWs的电阻率分别约为30Ω·cm和10mΩ·cm,并且触点有效地为欧姆。纳米线器件的这种减小的电阻归因于用于线成核和生长的Au或Zn催化剂对纳米线的掺杂。报告的最高掺杂线的纳米线电阻率明显低于基于Au或Zn在Si中的固溶度所预期的电阻率。表面状态在通过这些纳米线装置进行电子传输中所起的作用尚不清楚,但可能是所观察到的低电阻率的原因。

著录项

  • 作者

    Chung, Sung-Wook.;

  • 作者单位

    University of California, Los Angeles.;

  • 授予单位 University of California, Los Angeles.;
  • 学科 Chemistry Physical.; Engineering Materials Science.; Physics Condensed Matter.
  • 学位 Ph.D.
  • 年度 2000
  • 页码 171 p.
  • 总页数 171
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 物理化学(理论化学)、化学物理学;工程材料学;
  • 关键词

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