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Quantum well intermixing of indium gallium arsenide(phosphorus)/indium phosphorus heterostructures.

机译:砷化铟镓(磷)/铟磷异质结构的量子阱混合。

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摘要

This thesis studies several aspects of the interdiffusion of InGaAs(P)/InP quantum well (QW) heterostructures, from the fundamental defect mechanisms, through optimization of processing parameters, to novel device applications. Conclusions from each of these areas have been drawn which further the scientific understanding and the manufacturability of the technique.; The thermal stability of a series of different wafers is studied to highlight how poor quality of growth can cause increased interdiffusion, and to review the requirements for achieving repeatable annealing. Purposeful and controlled interdiffusion is accomplished through the introduction of excess defects into layers above the QWs, which during a subsequent anneal, diffuse through the QWs and enhance interdiffusion of atoms of the QWs with atoms of the barriers. These excess defects are introduced using two different techniques, via growth at low temperatures (LT) using chemical beam epitaxy (CBE), and via implantation of phosphorus ions.; The CBE LT growth technique is new, and reported for the first time in this thesis. Characterization of the as-grown layers leads us to believe that they have an excess of phosphorus. The diffusion rate of the mobile defects which cause the intermixing is also measured, and the interdiffusion is shown to occur predominantly on the group-V sublattice. Due to many similarities between this and the results of the implantation technique, it is proposed that these mobile defects are the same for both intermixing approaches, and that the behaviour can be explained by a phosphorus interstitial mechanism. Annealing recipes for the implantation-induced technique are optimized, and the sample-to-sample reproducibility of the blueshift for this method was found to be quite good (standard deviations of ∼6 meV on blueshifts of ∼70 meV). The lateral selectivity and refractive index changes are characterized, and used in combination to create novel buried waveguide devices.
机译:本文研究了InGaAs(P)/ InP量子阱(QW)异质结构互扩散的几个方面,从基本的缺陷机理到工艺参数的优化,再到新颖的器件应用。从这些领域的每个方面得出了结论,这些结论进一步促进了该技术的科学理解和可制造性。研究了一系列不同晶片的热稳定性,以突出不良的生长质量如何引起相互扩散,并回顾了实现可重复退火的要求。通过在QW上方的层中引入多余的缺陷来实现有目的且受控的相互扩散,在随后的退火过程中,多余的缺陷会扩散穿过QW并增强QW原子与势垒原子的相互扩散。这些多余的缺陷是通过两种不同的技术引入的:通过使用化学束外延(CBE)的低温生长(LT)和通过注入磷离子来实现的。 CBE LT生长技术是新技术,并且是本文首次报道。所生长的层的特征使我们相信它们具有过量的磷。还测量了导致混合的活动缺陷的扩散速率,并且显示出扩散主要发生在V组亚晶格上。由于这和注入技术的结果之间有许多相似之处,因此提出了两种混合方法的这些可移动缺陷是相同的,并且可以用磷间隙机制来解释其行为。优化了注入诱导技术的退火配方,发现该方法蓝移的样品间重复性非常好(蓝移约70 meV时标准偏差为6 meV)。表征了横向选择性和折射率变化,并结合使用以创建新颖的埋入式波导器件。

著录项

  • 作者

    Haysom, Joan E.;

  • 作者单位

    University of Ottawa (Canada).;

  • 授予单位 University of Ottawa (Canada).;
  • 学科 Physics Condensed Matter.
  • 学位 Ph.D.
  • 年度 2001
  • 页码 234 p.
  • 总页数 234
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 O49;
  • 关键词

  • 入库时间 2022-08-17 11:47:23

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