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Genetic and molecular analysis of the add3 (arrested development 3) mutant in Arabidopsis thaliana.

机译:拟南芥中add3(被阻滞的发育3)突变体的遗传和分子分析。

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摘要

add3 (arrested development 3) is a temperature-sensitive mutation in the plant Arabidopsis thaliana affecting leaf morphology. When an add3 mutant plant is grown at 21°C, leaves with non-expanding tips and margins exhibiting white mottled patches were observed. However, add3 plants grown at 29°C show an increase in expression of this phenotype. Leaf blade margin expansion is severely inhibited in these leaves (Kuttab, 2001). Hence, we hypothesized that ADD3 plays a key role during the normal differentiation and development of the margins of Arabidopsis leaves.; In this project, add3 was characterized genetically and molecularly by refinement of the physical-genetic map using molecular markers with genetic polymorphisms on chromosome 5. The high-resolution map required placement of known and newly designed molecular markers on a Bacterial Artificial Chromosome (BAC) contig. A candidate gene was identified using information from the Arabidopsis genome sequencing project. The high-resolution map around the add3 locus will facilitate the eventual cloning of the ADD3 gene.
机译:add3(受阻发育3)是植物拟南芥中影响叶片形态的温度敏感突变。当add3突变植物在21°C下生长时,观察到叶尖未扩张,边缘显示出白色斑点。但是,在29°C下生长的add3植物显示该表型的表达增加。这些叶片的叶片边缘扩展受到严重抑制(Kuttab,2001)。因此,我们假设ADD3在拟南芥叶片边缘的正常分化和发育过程中起关键作用。在该项目中,add3在5号染色体上使用具有遗传多态性的分子标记对物理遗传图谱进行了遗传和分子表征。高分辨率图谱需要在细菌人工染色体(BAC)上放置已知的和新设计的分子标记。重叠群使用来自拟南芥基因组测序项目的信息鉴定了候选基因。 add3基因座周围的高分辨率图将有助于ADD3基因的最终克隆。

著录项

  • 作者

    Regner, MaryAnn.;

  • 作者单位

    Loyola University Chicago.;

  • 授予单位 Loyola University Chicago.;
  • 学科 Biology Genetics.; Biology Botany.; Biology Molecular.
  • 学位 M.S.
  • 年度 2002
  • 页码 141 p.
  • 总页数 141
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 遗传学;植物学;分子遗传学;
  • 关键词

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