首页> 外文学位 >Precision tuning of silicon nanophotonic devices through post-fabrication processes.
【24h】

Precision tuning of silicon nanophotonic devices through post-fabrication processes.

机译:通过后加工工艺对硅纳米光子器件进行精确调谐。

获取原文
获取原文并翻译 | 示例

摘要

In recent years, silicon photonics has begun to transition from research to commercialization. Decades of relentless advances in the field of computing have led to fundamental bottlenecks in the design of computers, especially in interconnect bandwidth density. For IBM, silicon photonics has become a potential technological solution for enabling the future of server systems and cutting-edge supercomputers. For Intel, silicon photonics has become a cost-effective solution for supplying the necessary bandwidth needed by future generations of consumer computing products. While the field of silicon photonics is now advancing at a rapid pace there is still a great deal of research to be done.;This thesis investigates ways of improving the performance of fundamental silicon nanophotonic devices through post-fabrication processes. These devices include numerous optical resonator designs as well as slow-light waveguides. Optical resonators are used to confine photons both spatially and temporally. In recent years, there has been much research, both theoretical and experimental, into improving the design of optical resonators. Improving these devices through fabrication processes has generally been less studied. Optical waveguides are used to guide the flow of photons over chip-level distances. Slow-light waveguides have also been studied by many research groups in recent years and can be applied to an increasingly wide-range of applications.;The work can be divided into several parts: Chapter 1 is an introduction to the field of silicon photonics as well as an overview of the fabrication, experimental and computational techniques used throughout this work. Chapters 2, 3 and 4 describe our investigations into the precision tuning of nanophotonic devices using laser-assisted thermal oxidation and atomic layer deposition. Chapters 5 and 6 describe our investigations into improving the sidewall roughness of silicon photonic devices using hydrogen annealing and excimer laser induced melting. Finally, Chapter 7 describes our investigations into the nonlinear properties of lead chalcogenide nanocrystals.
机译:近年来,硅光子学已经开始从研究过渡到商业化。在计算领域数十年来的不懈进步已导致计算机设计的基本瓶颈,特别是在互连带宽密度方面。对于IBM而言,硅光子学已成为潜在的技术解决方案,可实现服务器系统和尖端超级计算机的未来。对于英特尔而言,硅光子学已成为一种经济有效的解决方案,可提供下一代消费计算产品所需的必要带宽。虽然硅光子学的领域正在迅速发展,但仍有大量的研究工作要做。这些设备包括众多的光学谐振器设计以及慢光波导。光学谐振器用于在空间和时间上限制光子。近年来,在改进光学谐振器的设计方面,已经进行了许多理论和实验研究。通过制造工艺改进这些器件的研究通常很少。光波导用于引导光子流过芯片级距离。近年来,许多研究小组也对慢光波导进行了研究,并且可以将其应用于越来越广泛的应用中。这项工作可以分为几个部分:第1章介绍了硅光子学领域,包括:以及整个工作中使用的制造,实验和计算技术的概述。第2、3和4章介绍了我们对使用激光辅助热氧化和原子层沉积对纳米光子器件进行精确调谐的研究。第5章和第6章描述了我们对使用氢退火和受激准分子激光诱导的熔化来改善硅光子器件的侧壁粗糙度的研究。最后,第7章描述了我们对硫族化物铅纳米晶体的非线性特性的研究。

著录项

  • 作者

    Chen, Charlton J.;

  • 作者单位

    Columbia University.;

  • 授予单位 Columbia University.;
  • 学科 Physics Electricity and Magnetism.;Engineering Metallurgy.;Nanotechnology.
  • 学位 Ph.D.
  • 年度 2011
  • 页码 163 p.
  • 总页数 163
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号