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A thin film P-type gallium nitride photocathode: Prospect for a high performance electron emitter.

机译:薄膜P型氮化镓光电阴极:高性能电子发射器的前景。

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The study of the electronic structure of gallium nitride (GaN) surfaces is undertaken in order to evaluate a wide band gap photocathode as a high performance electron source. In considering detailed studies targeting the starting surface of GaN (0001) and the nature of the activation layers using Cs only and Cs/O, an efficient and robust emitter is proposed.; Achieving clean surfaces is a major and challenging requirement for the study of any semiconductor surface. The use of synchrotron radiation (SR) to probe the electronic structure of the GaN (0001) surface that has undergone wet chemical cleaning sequences followed by heating is described. The refractive properties of GaN allow a simple and non-destructive surface preparation to be successful in removing C and O contaminants, involving chemical cleaning followed by thermal desorption.; The electron affinity for the clean surface measured is 3.3 +/− 0.2 eV using SRPES. The maximum reduction achieved in the electron affinity is approximately 3.0 +/− 0.2 eV by depositing ¾ ML of cesium at room temperature. In addition, the threshold for photoemission emission in spectral yield curves is at the band gap energy of GaN (3.4eV), demonstrating the NEA activation of GaN with Cs alone.; The chemistry of the traditional co-deposited cesium and oxygen (Cs/0) adlayer commonly used with small band gap III-V's is also investigated. These are the first studies reporting a molecular form of oxygen incorporated in the thin NEA activation layers and the charge state is found to determine the net dipole strength leading to the maximum yield obtainable with the Cs/O activation.; Last, a comparative study is performed between Cs/0 activated GaN (0001) and GaAs (100) investigating the decay in the quantum yield using low photon density. The quantum efficiency (QE) from the GaN (0001) photocathode remains constant within a few percent over a 10 hour period at ≥20% QE and decays by less than a factor of 2 over the subsequent 7 hours. In comparison to GaAs, the delayed and slowly decreasing monotonic yield for GaN gives preliminary evidence that wide band gap materials are more robust emitters.
机译:为了评估宽带隙光电阴极作为高性能电子源,对氮化镓(GaN)表面的电子结构进行了研究。在考虑针对GaN(0001)的起始表面和仅使用Cs和Cs / O的活化层的性质进行的详细研究时,提出了一种高效而坚固的发射极。实现干净的表面是研究任何半导体表面的主要且具有挑战性的要求。描述了使用同步加速器辐射(SR)探测经过湿化学清洗顺序后加热的GaN(0001)表面的电子结构。 GaN的折射特性允许简单且无损的表面处理成功去除碳和O污染物,包括化学清洗和热解吸。使用SRPES测得的清洁表面的电子亲和力为3.3 +/- 0.2 eV。通过在室温下沉积¾ML铯,可实现电子亲和力的最大降低,约为3.0 +/- 0.2 eV。另外,光谱产率曲线中光发射的阈值在GaN的带隙能量(3.4eV)处,表明仅用Cs对GaN的NEA活化作用。还研究了通常与小带隙III-V一起使用的传统共沉积铯和氧(Cs / 0)沉积层的化学性质。这些是第一批报道氧分子形式掺入薄层NEA活化层的研究,发现电荷状态决定了净偶极强度,从而导致了Cs / O活化所能获得的最大产率。最后,在Cs / 0激活的GaN(0001)和GaAs(100)之间进行了比较研究,研究了使用低光子密度的量子产率的下降。来自GaN(0001)光电阴极的量子效率(QE)在≥20%QE的情况下,在10个小时内保持百分之几的恒定值,并且在随后的7个小时内衰减不到2倍。与GaAs相比,GaN的延迟且缓慢降低的单调产量提供了初步的证据,表明宽带隙材料是更坚固的发射极。

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