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Hardware results demonstrating the effectiveness of defect detection and fault localization using multiple supply pad based IDDT measurements.

机译:硬件结果证明了使用基于多个供应板的IDDT测量进行缺陷检测和故障定位的有效性。

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摘要

Testing a digital integrated circuit is a costly process especially those designed and fabricated in modern DSM technologies. As technology scales down, the transistor density increases without a proportional increase in the number of I/Os. This poses a big challenge to the controllability and observability of internal nodes for testing with good defect/fault coverage. With the evolution of newer methods of fabrication like dual damascene copper process for interconnects, newer defect mechanisms have started showing their prominence. Traditional methods of testing by applying logic stimulus at the inputs and observing the response at the outputs is somewhat a thing of the past. Most testing is done with the help of structures that are designed to assist testing. This form of testing popularly known as "structural test" is very commonly used in the industry and has had immense success over the past few years. However, with pushing technology feature sizes even these methods are being pushed to their limits. Testing using power supply current provides another alternative and has been quite popular in the form of "IDDQ" testing. The power supply port provides a global observation point for the IC and eases pattern generation efforts for observability. IDDQ testing has been successful not only because of its simplicity but it also provided important information about chip reliability which was otherwise unavailable from logic test. However, IDDQ has been suffering from signal to noise problems due to increase in background leakage current caused due to technology scaling. A more promising technique is using "IDDT" testing which is the "Transient Current" counterpart of IDDQ testing. IDDT has similar advantages as IDDQ and can offer more. In this thesis, we will present a few innovative IDDT techniques that can enable IDDT testing of modern VLSI chips. Variations of the proposed techniques can be applied to IDDQ testing as well to extend it capabilities. Our proposed method uses current measurements made at multiple supply ports of the IC instead of one cumulative global current which is the current practice. Measuring the individual current offers multiple advantages. In this work we will show how enhanced defect detection sensitivity can be achieved using multiple supply pad measurements and compare it with a similar global current based technique using hardware chips fabricated in IBM 130 nm SOI process. We also propose a technique that can be used for fault localization using multiple supply pad measurements. Along with detailed analysis of the sensitivities of the techniques, we also address some of the aspects of test instrumentation that will most likely have an impact on the measured currents.
机译:测试数字集成电路是一个昂贵的过程,尤其是现代DSM技术中设计和制造的过程。随着技术的发展,晶体管密度增加,而I / O数量却没有成比例的增加。这给内部节点的可控性和可观察性带来了很大的挑战,以进行具有良好缺陷/故障覆盖率的测试。随着诸如双镶嵌铜互连工艺之类的新型制造方法的发展,较新的缺陷机制​​已开始显示其重要性。通过在输入端施加逻辑刺激并在输出端观察响应的传统测试方法已成为过去。大多数测试是在旨在协助测试的结构的帮助下完成的。这种测试形式通常称为“结构测试”,在业界非常普遍,并且在过去几年中取得了巨大的成功。但是,采用推动技术的功能尺寸,甚至将这些方法都推到了极限。使用电源电流进行测试提供了另一种选择,并且以“ IDDQ”测试的形式非常流行。电源端口为IC提供了一个全局观察点,并简化了可观察性的图形生成工作。 IDDQ测试不仅因为其简单性而获得成功,而且还提供了有关芯片可靠性的重要信息,而这些信息在逻辑测试中是无法获得的。但是,由于技术扩展导致背景泄漏电流增加,IDDQ一直遭受信噪比问题。一种更有前途的技术是使用“ IDDT”测试,它是IDDQ测试的“瞬态电流”对应物。 IDDT与IDDQ具有类似的优势,并且可以提供更多的优势。在本文中,我们将介绍一些创新的IDDT技术,这些技术可以实现对现代VLSI芯片的IDDT测试。提议的技术的变体也可以应用于IDDQ测试,以扩展其功能。我们提出的方法使用在IC的多个电源端口上进行的电流测量,而不是当前的一种累积全局电流。测量单个电流具有多个优点。在这项工作中,我们将展示如何使用多个电源焊盘测量来提高缺陷检测的灵敏度,并将其与使用IBM 130 nm SOI工艺制造的硬件芯片的类似基于全局电流的技术进行比较。我们还提出了一种可用于使用多个电源焊盘测量进行故障定位的技术。除了对这些技术的敏感性进行详细分析之外,我们还讨论了测试仪器的某些方面,这些方面很可能会对所测量的电流产生影响。

著录项

  • 作者

    Acharyya, Dhruva Jyoti.;

  • 作者单位

    University of Maryland, Baltimore County.;

  • 授予单位 University of Maryland, Baltimore County.;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2008
  • 页码 186 p.
  • 总页数 186
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-17 11:39:12

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