首页> 外文会议>The Thirteenth International Symposium on Molten Salts was held at the Centennial Celebration and 201st Meeting of the Electrochemical Society May 12-17, 2002 Philadelphia, Pennsylvania >ELECTRODEPOSITION OF TITANIUM-ALUMINUM ALLOYS IN THE LEWIS ACIDIC ALUMINUM CHLORIDE-1-ETHYL-3-METHYLIMIDAZOLIUM CHLORIDE MOLTEN SALT
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ELECTRODEPOSITION OF TITANIUM-ALUMINUM ALLOYS IN THE LEWIS ACIDIC ALUMINUM CHLORIDE-1-ETHYL-3-METHYLIMIDAZOLIUM CHLORIDE MOLTEN SALT

机译:刘易斯酸性氯化铝-1-乙基-3-甲基咪唑鎓氯化钠盐中的钛铝合金的电沉积

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The chemical and electrochemical behavior of titanium was examined in the Lewis acidic aluminum chloride-1-ethyl-3-methylimidazolium chloride (AlCl_3-EtMelmCl) molten salt at 353.2 K. Dissolved Ti(Ⅱ), as TiCl_2, is stable in the 66.7-33.3 m/o composition of this melt, but shows a slight tendency to disproportionate in the 60.0-40.0 m/o melt. At low current densities, the anodic oxidation of Ti(0) does not lead to dissolved Ti(Ⅱ), but to an insoluble passivating film of TiCl_3. At high current densities or very positive potentials, Ti(0) is oxidized to Ti(Ⅳ); however, the electro-generated Ti(Ⅳ) vaporizes from the melt as TiCl_4(g). The electrodeposi-tion of Ti-Al alloys was investigated at Cu rotating wire electrodes. Ti-Al alloys containing up to ~ 19 a/o titanium could be electrodeposited from saturated solutions of Ti(Ⅱ) in the 66.7-33.3 m/o melt at low current densities, but the titanium content of these alloys decreased as the reduction current density was increased. The pitting potentials of these electrodeposited Ti-Al alloys exhibited a positive shift with increasing titanium content comparable to that observed for alloys prepared by sputter deposition.
机译:在353.2 K的路易斯酸性氯化铝-1-乙基-3-甲基咪唑鎓氯化铝(AlCl_3-EtMelmCl)熔融盐中检测了钛的化学和电化学行为。溶解的Ti(Ⅱ)作为TiCl_2在66.7-该熔体的成分为33.3 m / o,但在60.0-40.0 m / o的熔体中显示出不成比例的趋势。在低电流密度下,Ti(0)的阳极氧化不会导致溶解的Ti(Ⅱ),而是会导致TiCl_3的不溶钝化膜。在高电流密度或非常正的电势下,Ti(0)被氧化为Ti(Ⅳ)。然而,电生成的Ti(Ⅳ)从熔体中蒸发为TiCl_4(g)。在铜旋转丝电极上研究了Ti-Al合金的电沉积。在低电流密度下,可以从66.7-33.3 m / o熔体中的Ti(Ⅱ)饱和溶液中电沉积含高达19 a / o钛的Ti-Al合金,但是这些钛的钛含量随着还原电流的降低而降低。密度增加。这些电沉积的Ti-Al合金的点蚀电位随着钛含量的增加呈现出正向偏移,这与通过溅射沉积制备的合金所观察到的相当。

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