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Contact/proximity stepper using UVA, UVB, and UVC light sources

机译:使用UVA,UVB和UVC光源的接触/接近步进器

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Novel wafer stepper by using contact or proximity printing was developed. The ultraviolet region starts right after the violet end of the rainbow. In scientific terms, UV radiation is electromagnetic radiation just like visible light, radar signals and radio broadcast signals. Ultraviolet radiation can be broken down into three bands: UVA, UVB, and UVC. Projection wafer stepper needs use single wavelength as light sources, such as: g-line, i-line, KrF and ArF. The broadband wavelengths of the UVA, UVB and UVC regions: UVA 400 nm - 315 nm, UVB 315 nm - 280 nm, UVC 280 nm - 100 nm can be used for contact or proximity exposure. Wafer stepper without using projection lens, system reliability and manufacturing cost of wafer stepper can be improved by using contact/ proximity method. This novel contact/ proximity wafer stepper can be used for 3DIC, MEMS and bio-chip lithography application by using thin and thick resist.
机译:通过使用接触或接近印刷开发了新型晶片步进机。紫外线区域从彩虹的紫色末端开始。用科学术语来说,紫外线是电磁辐射,就像可见光,雷达信号和无线电广播信号一样。紫外线辐射可分为三个波段:UVA,UVB和UVC。投影晶圆步进器需要使用单个波长作为光源,例如:g线,i线,KrF和ArF。 UVA,UVB和UVC区域的宽带波长:UVA 400 nm-315 nm,UVB 315 nm-280 nm,UVC 280 nm-100 nm可以用于接触或接近曝光。不使用投影透镜的晶片步进器,通过使用接触/接近方法可以提高系统可靠性和晶片步进器的制造成本。这种新颖的接触/接近晶片步进器通过使用薄而厚的抗蚀剂,可用于3DIC,MEMS和生物芯片光刻应用。

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