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Electronic Structure Analysis of Silicon Nanowires for High Conductivity in n- and p-channel Nanowire-FET

机译:n和p沟道纳米线FET中具有高导电性的硅纳米线的电子结构分析

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摘要

To investigate properties of SiNW-FETs, we have studied the band structures of SiNWs aligned to [100] direction with different diameters. Band structures of SiNWs have been derived by first principle calculation. In SiNWs aligned to [100] direction, effective masses of electron are much smaller than those of hole, while numbers of subbands (quantum channels) near the conduction and valance band edge don't have large difference. Those two factors determine the performance for a transistor. Also, inter-band scattering event is more frequent when intervals of subbands are narrower. Then, a trade-off model of the number of quantum channels has been proposed for an optimum diameter extraction.
机译:为了研究SiNW-FET的特性,我们研究了在不同直径下沿[100]方向排列的SiNW的能带结构。 SiNW的能带结构是通过第一原理计算得出的。在对准[100]方向的SiNW中,电子的有效质量比空穴的有效质量小得多,而在导带和价带边缘附近的子​​带(量子通道)的数量没有大的差异。这两个因素决定了晶体管的性能。另外,当子带的间隔较窄时,带间散射事件更加频繁。然后,提出了一种量子通道数量的权衡模型,以实现最佳直径提取。

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  • 来源
    《Solid state-general》|2008年|1-5|共5页
  • 会议地点 Honolulu HI(US);Honolulu HI(US);Honolulu HI(US)
  • 作者单位

    Interdisciplinary Graduate School of Science and Engineering, 4259-S2-20 Nagatsuta, Midori-ku, Yokohama, 226-8502, Japan;

    School of Pure and Applied Sciences, Univ. of Tsukuba, 1-1-1 Tennodai, Tsukuba, 305-8571, Japan;

    Frontier Research Center, Tokyo Institute of Technology, 4259-S2-20 Nagatsuta, Midori-ku, Yokohama, 226-8502, Japan;

    School of Pure and Applied Sciences, Univ. of Tsukuba, 1-1-1 Tennodai, Tsukuba, 305-8571, Japan;

    Interdisciplinary Graduate School of Science and Engineering, 4259-S2-20 Nagatsuta, Midori-ku, Yokohama, 226-8502, Japan;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料一般性问题;
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