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Amorphous Nanowires and Crystalline Thin Films of SiO_2-Li_2O Compounds obtained by Combustion Chemical Vapor Deposition

机译:燃烧化学气相沉积法制备SiO_2-Li_2O化合物的非晶纳米线和晶体薄膜

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摘要

Amorphous silica films deposited by Combustion Chemical Vapor Deposition (CCVD) were modified by lithium addition in the precursor solution. The modified films were characterized by X-ray diffraction and scanning and transmission electron microscopy. The addition of lithium promoted the crystallization of Li_2O-SiO_2 compounds, mainly crystalline phases like Li_2SiO_3, Li_2Si_2O_5, quartz and cristobalite. Besides that, the morphology of the film was modified, leading to the formation of acicular structures and nanowires. The acicular structures were identified through TEM associated with SAED as crystalline phases, mainly constituted by Li_2SiO_3 and Li_2SiO_5. TEM and SEM analysis indicated that the nanowire diameter is between 20 and 80nm. In addition to this, SAED and microprobe EDS analysis indicated that these nanowires are constituted by amorphous silica. The probable growth mechanism of these nanowires is the vapor-liquid-solid (VLS) catalyzed by a liquid particulate composed by Li_2O-SiO_2.
机译:通过燃烧化学气相沉积(CCVD)沉积的非晶硅膜通过在前体溶液中添加锂进行改性。通过X射线衍射以及扫描和透射电子显微镜对改性膜进行表征。锂的加入促进了Li_2O-SiO_2化合物的结晶,主要是结晶相,如Li_2SiO_3,Li_2Si_2O_5,石英和方石英。除此之外,膜的形态被改变,导致形成针状结构和纳米线。通过与SAED相关的TEM鉴定出针状结构为晶相,主要由Li_2SiO_3和Li_2SiO_5组成。 TEM和SEM分析表明纳米线直径在20至80nm之间。除此之外,SAED和微探针EDS分析表明,这些纳米线由无定形二氧化硅构成。这些纳米线的可能的生长机理是由Li_2O-SiO_2组成的液体颗粒催化的气液固(VLS)。

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