Improving Rate Control in Electron-Beam Evaporated Optical Coatings: Maintaining Source Surface Uniformity for Large Size Laser Optics Coatings and Evaluation of System Drift

摘要

This paper presents our experimental and modeling analysis used to develop new sweep patterns to reduce rate variations and maintain source depletion uniformity for silica e-beam evaporation during long deposition runs. In addition, process monitoring results that characterize the process drift for large size laser optics coatings and quantify the improvement of a new control tuning approach are also reported.