Prediction of the multiplex images appearance by computation of diffraction on their topology

摘要

The present work deals with the Multiplex Images (MIs) including stereographic and animated ones with opportunity topredict their appearance and behavior before they are recorded by Electron-Beam Lithography Equipment (EBLE). Onthe one hand the presence of MI in Optical Security Device (OSD) increases its structure complexity improving securityproperties; on the other hand it makes it more spectacular and visually impressive.The analysis of MI behavior on a visual level is based on the theoretical estimations of the diffraction by the phasereflecting Elemental Diffracting Grating (EDG) under the arbitrary Conditions of Lighting and Observation (CLO).These estimations start from the strict quantitative formulation of the Huygens-Fresnel principle that was by Kirchhoffpresented in 1883. They are also used for the assignment of encoding parameters for MI. The approach of middle wavezone is used, i.e. the distinctions in CLO for different points of MI topology are taken into account, which provides theintegrity of the scene during observation.To represent the diffraction results in the RGB color system, it has been proposed to use the non-linear colorcompensation. It allows to obtain more expressive highlights together with shadows within one computed angle shot.Experimental results show viability of the proposed approach to visualization. Undoubtedly, the opportunity ofpredicting the look of any MI, provided by this utility, is a powerful tool, which will help to create vivid and impressivediffractive images.