Design and Fabrication of Micro Mirror for MOEMS Devices by CMOS-MEMS Common Process

摘要

This paper would propose the design and fabrication methodology of micro mirror for MOEMS devices byCMOS-MEMS common process of CIC, Taiwan. The outstanding features of CMOS-MEMS are mass production, lowconnections, high precision and easy to combine the circuit with low noise. A {2 x 3} opposite type Micro ArrayThermal Actuator, MATA, is applied to drive the micro mirror for rotation. Such MOEMS would be as a high precisionmicro positioning device applied on the micro fabrication equipment. A novel elevating structure for the lift of micromirror is proposed. Warped suspension beam is originally applied on elevating a micro mirror in this work. A modifledelevating structure is proposed to improve the lift ofmicro mirror from 1. lim to l4im compared to original design.There are three parameters, width, length of the modified elevating structure and the number of single thermal actuatorsof parallel type MATA, for the performance simulation. The effects of operation voltage varied with three parameterson the displacement of Z axis direction are investigated. The optimum dimension of width, length of modified elevatingstructure and numbers of single thermal actuator are lOjim, 24Oim and {1 x 4} MATA, respectively. Finally, comparisonsof mask configuration and real part of finished devices are discussed by SEM photos. The surface quality ofmicro mirror is almost perfect and the material ofmicro mirror is aluminum.