Growth and applications of nanotube films

摘要

We have presented a method to produce carbon nanotube films bynmicrowave plasma enhanced CVD deposition and have characterised theirnelectron field emission by different techniques. First devices made outnof these films reveal that even though the emission is understood innterms of the underlying physics more effort has to be put in thentechnology to get uniform emitting films, with a narrow fieldnenhancement factor distribution and a controlled internal resistor beingnstable in time. By using a hot filament reactor we were able tonuniformly cover 4" wafers with nanotubes. Structured and patternednnanotube films have been grown and characterised with respect to theirnfield emission properties and their use for cold electron sources