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Photoelectrochemical Studies and Capacitance Measurements during the Nitride Passivation of InP in Liquid Ammonia (-55℃)

机译:液氨(-55℃)中InP的氮化钝化过程中的光电化学研究和电容测量

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This paper is based on fundamental photo-electrochemical studies of an anodic passivation process at the interface n-InP/liquid ammonia (-55 ℃). Thanks to X-ray Photoelectron Spectroscopy analyses, a reproducible polyphosphazene like film was reported on InP (-[(H_2N)-P=N]_(n~-)). A variation of the interfacial potential close to one volt is observed during the galvanostatic treatment. According to the anodic charge a gradual shift of the flat band potential is revealed while keeping the same slope of the Mott-Shottky straight line. As a consequence the graphical representation of C~2 =f(V) becomes drastically flat and extended over 1 volt. The modification of InP surface leads then to a high interfacial capacitance (≈ 2μF.cm~(-2)). The almost total lack of the photo-potential is another significant consequence of the passivation of InP. These results suggest the accumulation configuration of the modified interface.
机译:本文基于在n-InP /液氨(-55℃)界面上阳极钝化过程的基础光电化学研究。由于X射线光电子能谱分析,在InP(-[((H_2N)-P = N] _(n〜-))上报道了可再现的类似聚磷腈的薄膜。在恒电流处理期间,观察到界面电位接近一伏的变化。根据阳极电荷,在保持Mott-Shottky直线的相同斜率的同时,揭示了带状带电势的逐渐偏移。结果,C〜2 = f(V)的图形表示变得非常平坦,并扩展到1伏特以上。 InP表面的改性会导致较高的界面电容(≈2μF.cm〜(-2))。 InP钝化的另一个重要结果是几乎完全没有光电势。这些结果表明修改后的接口的累积配置。

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  • 会议地点 Chicago IL(US)
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    Institut Lavoisier de Versailles ILV - UMR- CNRS 8180 UVSQ, 45, Avenue des Etats-Unis 78035 Versailles Cedex- France;

    Institut Lavoisier de Versailles ILV - UMR- CNRS 8180 UVSQ, 45, Avenue des Etats-Unis 78035 Versailles Cedex- France;

    Institut Lavoisier de Versailles ILV - UMR- CNRS 8180 UVSQ, 45, Avenue des Etats-Unis 78035 Versailles Cedex- France;

    Institut Lavoisier de Versailles ILV - UMR- CNRS 8180 UVSQ, 45, Avenue des Etats-Unis 78035 Versailles Cedex- France;

    Institut Lavoisier de Versailles ILV - UMR- CNRS 8180 UVSQ, 45, Avenue des Etats-Unis 78035 Versailles Cedex- France;

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