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In-Situ Electrochemical Comparisons between GaAs and InP Regarding a Promising anodic Process in Liquid Ammonia.

机译:GaAs和InP关于液氨中有希望的阳极过程的原位电化学比较。

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摘要

A protective monolayer "phosphazene" like film on InP has been already successfully evidenced by a controlled anodic process in liquid ammonia (NH3 Liq.). In order to understand the formation mechanism of this passivating film, in-situ comparisons of electrochemical interface responses are performed as well on InP as GaAs. Current-voltage and interfacial capacity measurements are explored on both semiconductors. Similarities of electrochemical behaviours between these two semiconductors are striking. But contrary to InP, the initial surface state is electrochemically recovered by an in-situ cathodic treatment on GaAs. This absolute reversible electrochemical behaviour is definitively significant for GaAs.
机译:InP上的保护性单层“磷腈”类膜已通过液氨(NH3 Liq。)中的受控阳极过程成功地得到证明。为了了解该钝化膜的形成机理,还对InP和GaAs进行了电化学界面响应的原位比较。在这两种半导体上都探索了电流-电压和界面电容的测量方法。这两种半导体之间的电化学行为相似。但是与InP相反,通过在GaAs上进行原位阴极处理,电化学恢复了初始表面状态。这种绝对可逆的电化学行为对于GaAs无疑具有重要意义。

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  • 来源
  • 会议地点 Montreal(CA);Montreal(CA);Montreal(CA)
  • 作者单位

    Institut Lavoisier (ILV) CNRS UMR 8180 - Versailles University, France;

    Institut Lavoisier (ILV) CNRS UMR 8180 - Versailles University, France;

    Institut Lavoisier (ILV) CNRS UMR 8180 - Versailles University, France;

    Ecole Polytechnique, UMR- CNRS 7653 LHC, Palaiseau, France;

    Institut Lavoisier (ILV) CNRS UMR 8180 - Versailles University, France;

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  • 正文语种 eng
  • 中图分类 材料;
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