Ellipsometric Porosimetry : Fast and Non Destructive Technique for Characterization of Porous Low-K; Highlights on Plasma Damage and Water Effect on Treated Materials

摘要

Ellipsometric porosimetry (EP) is a non contact, non destructive approach based on a spectroscopic ellipsometric (SE) measurement which allows the precise determination of the refractive indices and thicknesses of the porous films. EP combined spectroscopic ellipsometric technique with a suitably adapted adsorption chamber. EP accords the great advantage of performing an in situ fast spectroscopic ellipsometric measurement at each stabilized pressure interval. From this combination, we can obtain morphological information such as open and closed porosity, pore size distribution, etc for thin films with an excellent sensitivity. In this paper we will focus on a SiOCH porous low-K sample. Using EP we will demonstrate that it is a porous hydrophobic material.We will then study the effect of plasma treatment on the material. The damaged layer will be characterized. By using water as an absorptive, we will be able to demonstrate the water degradation effect on treated materials.