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A Study of Storage Life Extension for High Performance Chemically Amplified Resist Coated Blank

机译:高性能化学放大抗蚀涂层毛坯的保质期研究

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The importance of advanced e-beam writing system and chemically amplified resist (CAR) coated blank is increasing gradually in high-end grade photomask manufacture according to CD embodiment of 90 nm and beyond technology node requiring because of the shrinkage of design rule in the semiconductor industry. However, many studies have been reported that CAR has several troubles and especially, CAR sensitivity change is occurred by airborne molecular contamination (AMC). So, the storage life of CAR coated blank is shortened. This problem may cause the difficulty of high-end grade photomask manufacture because it is hard to secure stable mean to target (MTT) and CD uniformity by sensitivity change, T-top profile and footing profile. Therefore, the purpose of this paper is to investigate the storage life extension for high performance CAR coated blank through improvement of the packing materials. Firstly, a variety of packing materials were collected and the selected packing materials were analyzed by Automatic Thermal Desorption Gas Chromatograph/Mass Spectrometer (ATD GC/MS) and Ion Chromatograph (IC) to examine AMC generated from the packing materials. As a result, molecular condensables such as alcohols, hydrocarbons and fatty acids were detected and molecular acids and molecular bases those are NH_4~+, Cl~-, NO_x~- and SO_x~- were also detected from the packing materials, respectively. From the above results, we selected the best packing materials which generated the least AMC and the worst packing materials which generated the most AMC. Additionally, we verified photomask process with CAR coated blanks which were packed with those packing materials with post coating delay (PCD) by 50 kV e-beam writing system. In consequence, dose to clear (DTC) showed 4.6 μC/cm~2 at 0 day PCD for both of the best and the worst packing materials of CAR coated blank. After 90 days PCD, DTC variation was only 0.4 μC/cm~2 for the best packing materials, but DTC variation of 4.0 μC/cm~2 showed in the worst packing materials. There was 10 times difference in DTC variation between the best and the worst packing materials. As well as, the CD variation at 0.5 μm dense line presented less than 5 nm movement for 90 days PCD.
机译:由于半导体设计规则的缩小,在根据90 nm的CD实施例的高端级光掩模制造中,先进的电子束写入系统和化学放大抗蚀剂(CAR)涂层的坯料的重要性正在逐步提高行业。但是,许多研究报告称,CAR存在若干问题,尤其是CAR灵敏度的变化是由空气传播的分子污染(AMC)引起的。因此,CAR涂层坯料的储存寿命缩短。由于难以通过灵敏度变化,T形顶部轮廓和立足轮廓来确保稳定的目标均值(MTT)和CD均匀性,因此该问题可能会导致高端光掩模制造的困难。因此,本文的目的是通过改进包装材料来研究高性能CAR涂层坯料的储存寿命延长。首先,收集各种填料,并使用自动热脱附气相色谱/质谱仪(ATD GC / MS)和离子色谱仪(IC)对选定的填料进行分析,以检查由填料产生的AMC。结果,从包装材料中检测到了醇,烃和脂肪酸等分子可冷凝物,并分别检测到了NH_4〜+,Cl〜-,NO_x〜-和SO_x〜-的分子酸和分子碱。从以上结果中,我们选择了产生最少AMC的最佳包装材料和产生最多AMC的最差包装材料。此外,我们通过用50 kV电子束写入系统以延迟涂覆后延迟(PCD)的填充材料包装了用CAR涂覆的坯件验证了光掩模工艺。因此,对于CAR涂布的空白的最佳和最差包装材料,在0天PCD时的清除剂量(DTC)显示为4.6μC/ cm〜2。 PCD 90天后,最佳包装材料的DTC变化仅为0.4μC/ cm〜2,而最差的包装材料的DTC变化为4.0μC/ cm〜2。最佳包装材料和最差包装材料之间的DTC差异相差10倍。而且,在90天的PCD中,CD在0.5μm的密集线上的变化小于5 nm。

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