Uniform nanoparticle based monolayers deposited by a modified spin coating technique

摘要

Controlled deposition of uniform cobalt nanoparticle based monolayers by a modified spin coating procedure wherein, the uniformity is demonstrated over the macroscopic scales is described. The nanoparticle dispersion rested on the entire area of the 6 inch silicon wafer for a curing time of 5 min after which the substrate was spun at 6000 rpm. The substrates were pre-coated with an alkyl terminated self assembled monolayer to assist the formation of nanoparticle based monolayer. A time dependent adsorption of nanoparticles was observed wherein the surface coverage of nanoparticles increased with curing time. The method described here is general and offers new opportunities to successfully employ the deposited films for nanoparticle based devices and related applications.