The Effect of Substrate Shape and Temperature on the Liquid Cluster Deposition using Molecular Dynamic simulation

摘要

Molecular dynamic simulations have been carried out to understand the effect of the shape of nano-structure substrate on the liquid cluster wettability at various temperature conditions. The Lennard-Jones potential was applied to argon as the cluster and platinum as the substrate. The shape of nano-structure substrate and the change of substrate temperature have a great effect on the accumulation ratio which is defined as the ratio of the height to the width of the accumulated liquid cluster. The formation change of substrate roughness affected to the behavior and wettability of liquid cluster. The roughness and temperature of substrate seem to have effect on the accumulation ratio. Liquid cluster well accumulated at the width of nano-structure substrate wider than narrow. The accumulation ratio decreased when temperature of nano-structure substrate increased. This paper could have better coating process by using high substrate temperature and substrate roughness.