Atom Probe Tomography Analysis of Thick Film SiO2 and Oxide Interfaces: Conditions Leading to Improved Analysis Yield

著录项

• 来源
  《International Metallographic Society Annual meeting;Microscopy Society of America Annual Meeting;Microanalysis Society Annual meeting》|2011年|750-751|共2页
• 会议地点 Nashville TN(US)
• 作者

  T.J. Prosa; D. Lawrence; D. Olson; D. Lenz; J.H. Bunton; D.J. Larson;

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• 作者单位

  Cameca Instruments Inc., 5500 Nobel Drive, Madison, WI, 53711;

  rnCameca Instruments Inc., 5500 Nobel Drive, Madison, WI, 53711;

  rnCameca Instruments Inc., 5500 Nobel Drive, Madison, WI, 53711;

  rnCameca Instruments Inc., 5500 Nobel Drive, Madison, WI, 53711;

  rnCameca Instruments Inc., 5500 Nobel Drive, Madison, WI, 53711;

  rnCameca Instruments Inc., 5500 Nobel Drive, Madison, WI, 53711;

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• 会议组织
• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词