TEM Study of Aluminum Oxynitride Films Prepared by Reactive R.F.-Sputtering

著录项

• 来源
  《International Metallographic Society Annual meeting;Microscopy Society of America Annual Meeting;Microanalysis Society Annual meeting》|2011年|1920-1921|共2页
• 会议地点 Nashville TN(US)
• 作者

  Li-Chung Lai; Masateru Nose; Wen-An Chiou; Atsushi Saiki;

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• 作者单位

  NISP Lab, NanoCenter, University of Maryland, College Park, MD 20742-2831;

  rnFaculty of Art and Design, Univ. of Toyama, 180 Futagami-machi, Takaoka 933-8588, Japan;

  NISP Lab, NanoCenter, University of Maryland, College Park, MD 20742-2831;

  School of Science and Engineering, Univ. of Toyama, 3190 Gofuku, Toyama 930-8555, Japan;

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• 会议组织
• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

• 入库时间 2022-08-26 14:04:26