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MEMS-enabled Dip Pen Nanolithography~® for Directed Nanoscale Deposition and High-Throughput Nanofabrication

机译:用于定向纳米级沉积和高通量纳米加工的具有MEMS功能的浸笔Nanolithography〜®

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Precision nanoscale deposition is a fundamental requirement for nanoscience research, development, and commercial implementation. Dip Pen Nanolithography~® (DPN~®) is an inherently additive SPM-based technique which operates under ambient conditions, making it suitable to deposit a wide range of biological and inorganic materials. This technique is fundamentally enabled by a portfolio of MEMS devices tailored for microfluidic ink delivery, directed placement of nanoscale materials via actuated cantilevers, and cm~2 tip arrays for high-throughput nanofabrication. Multiplexed deposition of nanoscale materials is a challenging problem, but we have implemented Ink Wells™ to enable selective delivery of ink materials to different tips in multiple probe arrays, while preventing cross-contamination. Active Pens™ can take advantage of this, directly place a variety of materials in nanoscale proximity, and do so in a "clean" fashion since the cantilevers can be manipulated in Z. Further, massively parallel two-dimensional nanopatterning with DPN is now commercially available via Nanolnk's 2D nano PrintArray™, making DPN a high-throughput, flexible and versatile method for precision nanoscale pattern formation. By fabricating 55,000 tip-cantilevers across a 1 cm2 chip, we leverage the inherent versatility of DPN and demonstrate large area surface coverage, routinely achieving throughputs of 3×10~7 μm~2 per hour. Further, we have engineered the device to be easy to use, wire-free, and fully integrated with the Nscriptor's scanner, stage, and sophisticated lithography routines. In this talk we discuss the methods of operating this commercially available device, and subsequent results showing sub-100 nm feature sizes and excellent uniformity (standard deviation < 16%). Finally, we will discuss applications enabled by this MEMS portfolio including: 1) rapidly and flexibly generating nanostructures; 2) chemically directed assembly and 3) directly writing biological materials.
机译:精确的纳米级沉积是纳米科学研究,开发和商业实施的基本要求。浸笔式纳米光刻技术(DPN〜®)是一种固有的基于SPM的添加剂技术,可在环境条件下运行,使其适合沉积各种生物和无机材料。这项技术从根本上通过为微流体墨水量身定制的MEMS设备,通过致动悬臂定向放置纳米级材料以及用于高通量纳米加工的cm〜2尖端阵列而实现。纳米级材料的多重沉积是一个具有挑战性的问题,但是我们已经实施了Ink Wells™,能够选择性地将油墨材料输送到多个探针阵列的不同尖端,同时防止交叉污染。 Active Pens™可以利用这一优势,直接将各种材料放置在纳米级附近,并以“干净”的方式放置,因为悬臂可以在Z轴上进行操纵。此外,目前在商业上使用DPN进行大规模并行的二维纳米图案化已在商业上可通过Nanolnk的2D nano PrintArray™获得,从而使DPN成为用于精密纳米级图案形成的高通量,灵活且通用的方法。通过在1 cm2的芯片上制造55,000个尖端悬臂,我们充分利用了DPN的固有多功能性,并展示了大面积的表面覆盖率,通常实现了每小时3×10〜7μm〜2的吞吐量。此外,我们对设备进行了设计,使其易于使用,无线连接并与Nscriptor的扫描仪,平台和复杂的光刻例程完全集成。在本次演讲中,我们讨论了操作这种市售设备的方法,以及随后的结果,这些结果显示了低于100 nm的特征尺寸和出色的均匀性(标准偏差<16%)。最后,我们将讨论由该MEMS产品组合实现的应用,包括:1)快速而灵活地生成纳米结构; 2)化学指导的组装和3)直接书写生物材料。

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