Wavefront Sensor Using Double-efficiency Quad-cells for the Measurement of High-order Ocular Aberrations

摘要

This paper presents a discussion about an alternative layout for optical wavefront sensors, which is composed of position-sensitive detectors (PSDs) of the quad-cell type with two different sensitivity regions (i.e. quantum efficiencies). This wavefront sensor can be used in the measurement of high-order ocular aberrations, associated with the Hartmann-Shack method. The proposed layout is compatible with the standard complementary metal-oxide-semiconductor (CMOS) technology. It provides smaller measurement errors than conventional wavefront sensors, once the quad-cell response can be better approximated to a linear response. In this article, some characteristic project parameters are discussed based on numerical simulation results, so as to make the sensor suitable for high-order ocular aberrations measurement.