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Manufacturing and investigation of objective lens for ultrahighresolution lithography facilities

机译:用于超高分辨率光刻设备的物镜的制造和研究

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摘要

Status of activities in field of manufacturing and investigation of objective lens for ultrahigh resolution lithography facilities carrying out in IPM RAS is reported. Some physical aspects of operation of interferometers with diffraction reference wave are considered. A scheme of a point diffraction interferometer developed in IPM is presented. Last experimental data on making high precision spherical substrates with NA = 0.25 are presented. A problem of surface shape measurements of aspherical substrates with a help of a point diffraction interferometer is discussed. A scheme of measurements and experimental data of wave deformation of 6-lens objective are given.
机译:报告了在IPM RAS中进行的超高分辨率光刻设备的物镜制造和研究领域的活动状况。考虑了具有衍射参考波的干涉仪工作的一些物理方面。提出了一种在IPM中开发的点衍射干涉仪的方案。给出了制造NA = 0.25的高精度球形基底的最新实验数据。讨论了借助点衍射干涉仪测量非球面基板表面形状的问题。给出了六透镜物镜波变形的测量方案和实验数据。

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