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Parasitic Bipolar Effect in Modern SOI CMOS Technologies

机译:现代SOI CMOS技术中的寄生双极效应

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摘要

Parasitic bipolar effect can significantly decrease SEE tolerance of modern deep submicron bulk and SOI CMOS devices due to amplification of charge collected in interaction between silicon and single ionizing particles. This article is dedicated to studies of bipolar effect phenomenon in modern SOI CMOS technologies and to increasing SEE tolerance without technology modifications.
机译:由于硅和单个电离粒子之间相互作用中收集的电荷放大,寄生双极效应会显着降低现代深亚微米体和SOI CMOS器件的SEE容限。本文致力于研究现代SOI CMOS技术中的双极性效应现象,并在不进行技术修改的情况下提高SEE容限。

著录项

  • 来源
  • 会议地点 Zvenigorod(RU)
  • 作者单位

    Moscow Engineering Physical Institute (State University), Moscow, Kashirskoe shosse, 31 Scientific Research Institute for System Studies, Russian Academy of Science, Moscow,rnNakhimovskiy prospect, 36-1;

    Moscow Engineering Physical Institute (State University), Moscow, Kashirskoe shosse, 31 Scientific Research Institute for System Studies, Russian Academy of Science, Moscow,rnNakhimovskiy prospect, 36-1;

    Moscow Engineering Physical Institute (State University), Moscow, Kashirskoe shosse, 31;

    Scientific Research Institute for System Studies, Russian Academy of Science, Moscow,rnNakhimovskiy prospect, 36-1;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 微电子学、集成电路(IC);
  • 关键词

    single event effect; parasitic bipolar transistor; radiation hardness; SOI;

    机译:单事件效应寄生双极晶体管辐射硬度SOI;

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