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Design Methods for 3D Membrane Projection Lithography Metasurface Unit Cells

机译:3D膜投影光刻元表面单元细胞的设计方法

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Three dimensional metasurface structures hold the potential for better performing devices and interesting new properties. However, at optical frequencies it is very difficult to fabricate truly three dimensional designs. One of the most promising techniques is Membrane Projection Lithography (MPL), which can allow for dielectric and metallic inclusions to be deposited on the side wall of a cavity. However, the design process is difficult due to the large search space afforded by these 3D structures and the many coupling environments that arise between neighboring unit cells. Fortunately, advanced optimization techniques have been developed that allow for the space to be fully explored in an efficient manner for optimal designs.
机译:三维元表面结构具有更好的执行设备和有趣的新属性的可能性。然而,在光学频率下,非常难以制造真正的三维设计。最有前途的技术之一是膜投影光刻(MPL),其可以允许介电和金属夹杂物沉积在腔的侧壁上。然而,由于这些3D结构的大型搜索空间以及相邻单元电池之间出现的许多耦合环境,因此设计过程很难。幸运的是,已经开发出高级优化技术,以便以有效的方式全面探索空间以获得最佳设计。

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