Inquiry the Anode Effect on Growth Thin Films on the Flat Glass in D.C Plasma Magnetron Sputtering by Hollow Cathode and Study About Optical Properties of Copper Film Sputtered on the Zinc Substrate in Different Conditions

摘要

Summary form only given. The variation of anode shape is cause to changing the rate of deposition. In this paper, we compared the deposition rate of two kind of copper anode (cylindrical and disk) and then we changed the position magnetic field and studied its effect on the growth copper film in argon and nitrogen gases. Also we investigated the optical properties (by AFM and spectrophotometry) on the growth of copper film on the zinc substrate in different conditions of variation of magnetic field and changing the gases. Then we also discussed the possibility of sputtering thin films in the optimum conditions