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Copper Thin Film Deposited By PVD on Aluminum AA4015 Substrate for Thermal Solar Application

机译:PVD铜薄膜在铝AA4015基板上沉积,用于热太阳能应用

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摘要

The copper nanoparticles (CuNP) films have been deposited on Aluminum-4015 substrate by PVD technique. Structural of thin film layer achieved have been analyzed by X-ray diffraction (XRD). While the chemical composition percentage of the multilayers (Zn-Ni) combined with thin layer and substrate evaluated via ED-XRF, other characterization likes surface morphology have been investigated by using scanning electron microscopy (SEM), FESM and AFM .Optical properties especially thermal absorption was measured in the UV/Vis range. The effect of coating parameter like time coating resulting different thickness thin film (50,100 and 150) nm deposited on Aluminum substrate have been studied and the influence on optical properties. SEM analysis and AFM results show that prepared films were denser with nanosize grains between (26-54) nm. Also, XRD results show nano copper was the main chemical component in the films. The films prepared by this technique have better optical properties like good absorption ranged between (87%-97%). Decreasing the emittance and increase the absorption leads finally achieve a good selectivity coating using in the solar thermal application.
机译:通过PVD技术沉积铜纳米粒子(CUNP)膜在铝-4015底物上沉积。通过X射线衍射(XRD)分析了所实现的薄膜层的结构。虽然通过ED-XRF评估的多层(Zn-Ni)的化学成分(Zn-Ni)与薄层和基材组合,但是通过使用扫描电子显微镜(SEM),Fesm和AFM,研究了其他表征的其他表征。特别是热敏性的,研究了表面形态。在UV / VIN范围内测量吸收。已经研究了涂覆参数的涂层参数,其产生不同厚度薄膜(50,100和150)Nm沉积在铝基板上的施加并对光学性质的影响。 SEM分析和AFM结果表明,制备的薄膜含有纳米粒度(26-54)Nm之间的浓度。此外,XRD结果显示纳米铜是薄膜中的主要化学成分。通过该技术制备的薄膜具有更好的光学性质,如良好的吸收范围(87%-97%)。减少吸收率和增加吸收引线最终在太阳能热应用中实现了良好的选择性涂层。

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