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Enhanced Absorption of Single Silicon Nanowire with Si_3N_4 Shell for Photovoltaic Applications

机译:用Si_3N_4壳体增强单硅纳米线的吸收,用于光伏应用

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Based on the Lorenz-Mie light scattering theory, we have calculated the light absorption of single silicon nanowire with Si_3N_4 coating, and compared with pure single silicon nanowire. The calculated result indicates that there exists an enhanced absorption in the Si_3N_4-coated silicon nanowire and shows a great photocurrent enhancement factor (-70%) for the coaxial NW with the shell thickness of -70 ran. For a special shell thickness (175 nm) in the Si_3N_4-coated silicon nanowire for r = 150 nm, the enhancement comes up to -98.45%.
机译:基于Lorenz-Mie光散射理论,我们已经计算了用Si_3N_4涂层的单硅纳米线的光吸收,并与纯单硅纳米线相比。计算结果表明,在Si_3N_4涂覆的硅纳米线中存在增强的吸收,并且具有用于同轴NW的具有厚度的光电流增强因子(-70%),其壳厚度为-70 ran。对于用于r = 150nm的Si_3N_4涂覆的硅纳米线中的特殊壳体厚度(175nm),增强率高于-98.45%。

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