首页> 外文会议>International proceedings on Radiation Physics >Investigation of structural and optical properties of Ag nanoclusters formed in Si(100) after multiple implantations of low energies Ag ions and post-thermal annealing at a temperature below the Ag-Si eutectic point
【24h】

Investigation of structural and optical properties of Ag nanoclusters formed in Si(100) after multiple implantations of low energies Ag ions and post-thermal annealing at a temperature below the Ag-Si eutectic point

机译:在低能量Ag离子的多种植入后Si(100)中形成的Ag纳米能器结构和光学性质的研究和Ag-Si共晶点低于温度后的热退火

获取原文

摘要

Multiple low energies (78 keV, 68 keV and 58 keV) of Ag ions with different fluences up to 1 ×10~(16) atoms/cm~2 were sequentially implanted into Si(100) to create a distribution of different sizes and densities of buried metal nanoclusters (NC) at the near-surface layers. These structures have applications in fields involving plasmonics, optical emitters, photovoltaic, and nano-electronics. The dimension, location and concentration of these NCs influence the type of the applications. The implantation profiles were simulated by utilizing the widely used Stopping and Range of Ions in Matter (SRIM) code as well as a dynamic-TRIM code, which accounts for surface sputtering. The implanted samples were subsequently annealed either in a gas mixture of 4% H_2 + 96% Ar or in vacuum at a temperature ~500 °C up to 90 minutes. The annealing was carried out below the eutectic temperature (~ 841 °C) of Ag-Si to preferentially synthesize Ag NCs in Si rather than silicide. In order to study the size, concentration and distribution of the Ag NCs in Si, the samples were characterized by Rutherford Backscattering Spectrometry (RBS), X-ray photoelectron spectroscopy (XPS) in combination with Ar-ion etching, and Transmission Electron Microscopy (TEM) techniques. The annealed samples showed a preferential distribution of the Ag NCs' sizes up to 10 nm either near the surface region (< 25nm) or at deeper layers (60-80 nm) closer to the interface of the implanted layer with the crystalline Si substrate. Ag NCs of larger diameters (up to 15 nm) were seen in the annealed sample near the peak concentration positions (~35-55 nm) of the implanted Ag ions. We have investigated the optical absorption properties due to these nano-structures in Si. The multiple energy implanted samples annealed in a gas mixture of 4% H_2 + 96% Ar show enhancements in the optical absorption in the visible range.
机译:依次植入到Si(100)中的不同流量不同流量的Ag离子的多个低能量(78keV,68keV和58keV),以植入Si(100)以产生不同尺寸和密度的分布在近表面层处的掩埋金属纳米团簇(NC)。这些结构具有在涉及血浆,光学发射器,光伏和纳米电子的领域的应用。这些NCS的尺寸,位置和浓度影响了应用的类型。通过利用所广泛使用的停止和离子范围(SRIM)代码以及动态修剪码来模拟植入型材,这占表面溅射。随后将植入的样品在4%H_2 + 96%Ar的气体混合物中或在温度下真空〜500℃的真空退火,至多90分钟。退火在Ag-Si的共晶温度(〜841℃)下进行,优先合成Si而不是硅化物。为了研究Si中Ag NCs的尺寸,浓度和分布,通过Rutherford背散射光谱法(RBS),X射线光电子能谱(XPS)与Ar离子蚀刻和透射电子显微镜( TEM)技术。退火的样品显示Ag NCS尺寸的优先分布,最多10nm,或者在表面区域(<25nm)附近或更深层(60-80nm)与晶体Si衬底的植入层的界面更靠近植入层。在植入Ag离子的峰值浓度位置(〜35-55nm)附近的退火样品中看到较大直径(最多15nm)的Ag ncs。我们研究了Si中这些纳米结构引起的光学吸收性能。在4%H_2 + 96%AR的气体混合物中退火的多能植入样品显示出可见范围中的光学吸收的增强。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号