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Effects of Chromate and Molybdate Ions on Scratch Repassivation Behavior of Precipitation Hardened Aluminum Alloys

机译:铬酸盐和钼酸盐离子对沉淀硬化铝合金划痕回复行为的影响

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摘要

Scratch depassivation of AA2024-T351, AA7075-T6, and 99.999% aluminum in molybdate (MoO_4~(2-)) and chromate (CrO_4~(2-)) containing NaCl solutions was used to examine electrochemical repassivation kinetics over a range of potentials and inhibitor concentrations. Single frequency impedance measurements were taken in the capacitive region of frequency response. Capacitance measurements enabled the observation of the effects of inhibitor additions on oxide growth as protective oxide films formed on the scratched electrode surface. Chromate was found to suppress scratched electrode current transients at high potentials on both AA2024-T351 and AA7075-T6. Capacitance measurements revealed the rapid growth of a thick, protective oxide when concentrations as low 5 mM CrO_4~(2-) were in solution. Molybdate did not suppress transient current density in AA2024-T351 or AA7075-T6. However, capacitance measurements in the presence of molybdate also indicate the rapid growth of a passive film.
机译:使用NaCl溶液的AA2024-T351,AA7075-T6和99.999%铝的AA2024-T351,AA7075-T6和99.999%铝的铝和铬酸盐(CRO_4〜(2-))在一系列潜在潜力中检查电化学回归动力学和抑制剂浓度。在频率响应的电容区域中拍摄单频阻抗测量。电容测量使得观察抑制剂添加对氧化物生长的影响,作为在划痕电极表面上形成的保护氧化物膜。发现铬酸盐在AA2024-T351和AA7075-T6上以高电位抑制刮擦电极电流瞬变。电容测量显示在溶液中浓度为低5mm CRO_4〜(2-)时,厚的保护氧化物的快速生长。钼酸盐没有抑制AA2024-T351或AA7075-T6中的瞬态电流密度。然而,在钼酸盐存在下的电容测量还表明了无源膜的快速生长。

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