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Improved Electroluminescence from nc-Si film Embedded in p-i-n Structure LED

机译:从P-I-N结构LED中嵌入的NC-Si膜改善了电致发光

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Intensive electroluminescence (EL) visible to the naked eyes is observed from p-i-n structure light emitting diodes with nanocrystalline Si (nc-Si) film as the luminescent layer. It is found the luminescence intensity increases by 20 times compared with that of nc-Si film without p-i-n structure and the turn-on voltage is sharply reduced. Combined with I-V and TEM analysis, the improved EL is attributed to the enhancement of carrier injection probability of nc-Si inserted in p-i-n structure.
机译:从P-I-N结构发光二极管与纳米晶Si(NC-Si)膜作为发光层,观察到肉眼可见的强烈电致发光(EL)。发现发光强度与没有P-I-N结构的NC-Si膜的发光强度增加20次,并且急剧降低了开启电压。结合I-V和TEM分析,改进的EL归因于插入P-I-N结构中的NC-Si的载波注射概率的增强。

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